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Semiconductors: First ever atom-by-atom simulation of ALD nanoscale film growth |
February 06, 2014
Researchers have produced the first ever atom-by-atom simulation of nanoscale film growth by atomic layer deposition (ALD) -- a thin-film technology used in the production of silicon chips.
Link: http://feeds.sciencedaily.com/~r/sciencedaily/computers_math/computer_science/~3/aztdYkEoBSM/140205125413.htm
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